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Department of War Release 6 PDF PDF

DOW-UAP-D121, AAWSAP DIRD, Pulsed High-Power Microwave Source Technology, January 2010

This document is a Defense Intelligence Reference Document (DIRD), a technical reference format used by the Defense Intelligence Agency (DIA) to capture baseline knowledge on a specific topic for later analytic use. DIRDs are best understood as reference and synthesis products rather than as original research. It is one of 38 DIRDs produced under the Advanced Aerospace Weapon System Applications Program (AAWSAP) between 2009 and 2011. Because AAWSAP’s scope permitted a broad range of supporting topics, not every DIRD in the series directly concerns aerospace systems or future threat assessment. The following summary reflects the DIRD’s scope and framing at the time of writing and should not be read as implying current validation of the concepts discussed. This DIRD surveys pulsed high-power microwave (HPM) source technology and argues that such systems remain of military interest because they can disrupt or damage electronic systems with short, intense electromagnetic pulses. The report reviews the main source types and the supporting technologies they depend on, including high-voltage insulation, switching, cathode materials, antennas, and pulse-power generation. It emphasizes the difficulty of building systems that are compact, efficient, and practical to field, since short pulse durations, antenna size, heating, detectability, and beam or signal quality all impose hard engineering limits. Its overall conclusion is that the technology has significant potential military value, but that further progress depends on advances in cathodes, predictive modeling, high-speed high-voltage switching, and low-loss insulation, while compact ultrawideband systems will remain difficult because of basic physical constraints on antenna design.

Record: DOW-UAP-D121 Record Type: PDF File Format: PDF Date: 1/28/10 Location: Las Vegas, Nevada File: release-06/DOW-UAP-D121_AAWSAP-DIRD-Pulsed-High-Power-Microwave-Source-Technology-January-28-2010.pdf

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